Pattern forming method and pattern forming apparatus

Details Pattern forming method and pattern forming apparatus Pattern forming method and pattern forming apparatus

1999-12-15

2000-12-26

Baxter, Janet

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430296, G03F 900

Patent

active

061656526

ABSTRACT:
A method of forming a photomask of a semiconductor device comprising the steps of forming a photosensitive film on a substrate and exposing the photosensitive film on the substrate by radiating with a radiation beam a plurality of butting unit regions defining butting portions between the butting unit regions and controlling said radiating of the butting unit region so that the butting portions of the butting unit regions are formed only in portions corresponding to isolation regions or alternatively, they are not formed in portions corresponding to contact areas.

REFERENCES:
patent: 4735881 (1988-04-01), Kobayashi et al.

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