Pattern forming method and apparatus for fabricating...

Details Pattern forming method and apparatus for fabricating... Pattern forming method and apparatus for fabricating...

2005-11-22

2005-11-22

Mathews, Alan (Department: 2851)

Photography

Fluid-treating apparatus

Fluid application to one side only of photographic medium

C355S027000, C355S067000

Reexamination Certificate

active

06966710

ABSTRACT:
A resist film is formed out of a resist material on a substrate, and then pre-baked. Next, the pre-baked resist film is exposed to extreme ultraviolet radiation through a photomask. Then, the exposed resist film is developed, thereby defining a resist pattern on the substrate. The pre-baking and exposing steps are carried out in a vacuum without subjecting the resist film to the air.

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patent: 6074804 (2000-06-01), Endo et al.
patent: 6245491 (2001-06-01), Shi
patent: 6368776 (2002-04-01), Harada et al.
patent: 6449332 (2002-09-01), Chiba
patent: 6897455 (2005-05-01), Lin
patent: 5-206020 (1993-08-01), None
patent: 2000-131854 (2000-05-01), None
www.lamrc.com, TCP© 9400DFM-Silicon Etch, Jul. 24, 2003, Lam RESEARCH©, 3 pgs.

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