Pattern forming method

Details Pattern forming method Pattern forming method

2005-05-24

2005-05-24

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

C430S005000, C430S030000

Reexamination Certificate

active

06896998

ABSTRACT:
A pattern forming method comprising the steps of: detecting a position of a base pattern formed on a substrate; forming a photosensitive resin film on the substrate; correcting a pattern data of a pattern to be formed on the substrate, based on a positional information of the base pattern to thereby compute a corrected pattern data; displaying a mask pattern on a liquid crystal panel, based on the corrected pattern data; and exposing the photosensitive resin film with the liquid crystal panel as a mask and developing the same to thereby pattern the photosensitive resin film. Even when a base pattern has rotations, shrinkages, distortions, etc., a prescribed upper layer pattern can be formed in alignment with the lower layer pattern.

REFERENCES:
patent: 6251550 (2001-06-01), Ishikawa
patent: 6379867 (2002-04-01), Mei et al.
patent: Hei 08-097119 (1996-04-01), None
patent: Hei 09-148223 (1997-06-01), None

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