Pattern-forming method

Details Pattern-forming method Pattern-forming method

1986-02-05

1987-10-06

Kittle, John E.

Coating processes

Electrical product produced

Welding electrode

430297, 430299, 427 541, 156646, B05D 306

Patent

active

046982388

ABSTRACT:
A pattern is formed by providing a reaction field in which a photo-induced reaction proceeds when a substrate is irradiated with light so as to form a pattern on the substrate, and setting, in the reaction field, conditions for establishing a nonlinear relationship between the intensity of the light and the rate of the photo-induced reaction. The substrate is selectively irradiated with light in the reaction field under the conditions set therein so as to selectively form a pattern in the irradiated portion of the substrate in accordance with the selective irradiation.

REFERENCES:
patent: 4107349 (1978-08-01), Vig
patent: 4414059 (1983-11-01), Blum et al.
patent: 4595601 (1986-06-01), Horioka et al.

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