Pattern-forming materials having a radiation sensitive chalcogen

Details Pattern-forming materials having a radiation sensitive chalcogen Pattern-forming materials having a radiation sensitive chalcogen

1977-06-08

1978-11-28

Kimlin, Edward C.

Gas separation: apparatus

Electric field separation apparatus

Including gas flow distribution means

96 35, 96 36, 96 88, 252501, G03C 176, G03C 100, G03C 500

Patent

active

041274148

ABSTRACT:
A pattern-forming material comprises a substrate and a radiation sensitive chalcogenide layer disposed thereon. The radiation sensitive chalcogenide layer consists of an amorphous layer having a chemical composition of 75 to 95 mol% of selenium and 5 to 25 mol% of germanium and a silver layer superimposed thereon. The pattern-forming materials having the radiation sensitive chalcogenide layer of the invention are particularly useful in lithographic applications.

REFERENCES:
patent: 3707372 (1972-12-01), Hallman et al.

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