Pattern forming material and process for forming pattern using t

Details Pattern forming material and process for forming pattern using t Pattern forming material and process for forming pattern using t

1993-09-13

1995-11-28

Chan, Nicky

Organic compounds -- part of the class 532-570 series

Organic compounds

Sulfonate esters

C07C30965, C07C30966

Patent

active

054709962

ABSTRACT:
A pattern can be formed on a substrated using a pattern forming material comprising (a) a medium, e.g. a polymer or compound, having reactivity for changing solubility in an alkali aqueous solution by a reaction using an acid as a catalyst, and (b) as an acid precursor an alkylsulfonic acid ester obtained from a compound having at least two phenolic hydroxyl groups.

REFERENCES:
patent: 3346612 (1967-10-01), Hansen
patent: 3622610 (1971-11-01), Hausermann et al.
Castellino et al., J. Org. Chem., 51, 1006 (1986).
Schlegel et al., Chem. Mater., 2(3), 299-305 (1990) (Chem. Abstr., 112, 226587q, 1990).
Hayakawa et al., 112--169183d (1990)--Abstract of Kokai Tokkyo Koho JP 01,182,089 (1989).
Stott et al., Chem. Abstr., 94--156,889y (1981).

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