Pattern-forming apparatus using a photomask

Details Pattern-forming apparatus using a photomask Pattern-forming apparatus using a photomask

2006-11-14

2006-11-14

Fuller, Rodney (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S078000, C430S005000

Reexamination Certificate

active

07136145

ABSTRACT:
An apparatus for forming a pattern by using a photomask including both a minute aperture where a main component of a transmitted light is an evanescent light and an aperture where a main component of a transmitted light is a propagating light. The apparatus includes a sample stand for placing a substrate to be processed on which a photoresist with a film thickness equal to or smaller than a width of the minute aperture is formed, a stage for placing the photomask, a light source for generating light for exposure, and a device for controlling a distance between the substrate to be processed and the photomask.

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