Pattern forming apparatus and pattern forming method

Details Pattern forming apparatus and pattern forming method Pattern forming apparatus and pattern forming method

2007-09-27

2011-10-11

Lightfoot, Elena T (Department: 1715)

Incremental printing of symbolic information

Ink jet

Ejector mechanism

C347S111000, C347S112000, C347S153000, C101SDIG037

Reexamination Certificate

active

08033648

ABSTRACT:
A pattern forming apparatus which forms a pattern of an electroconductive liquid on a printing medium includes a pattern forming substrate having an insulating substrate, a plurality of electrodes arranged on the insulating substrate, and an insulating layer which covers the electrodes, an electric potential controller which selectively applies an electric potential to the electrodes, and a transferring mechanism which transfers the pattern by bringing the electroconductive liquid formed as a predetermined pattern on the insulating layer, in contact with the printing medium. Accordingly, it is possible to form a fine pattern at a low cost.

REFERENCES:
patent: 4263601 (1981-04-01), Nishimura et al.
patent: 5777576 (1998-07-01), Zur et al.
patent: 2003/0085057 (2003-05-01), Hashimoto
patent: 11163499 (1999-06-01), None
patent: 2000216330 (2000-08-01), None
patent: 2003142802 (2003-05-01), None
patent: 2003309085 (2003-10-01), None
patent: WO 2006/008736 (2006-01-01), None
XP011123267—Hagberg J et al: Direct Gravure Printing (DGP) Method for Printing Fine-Line Electrical Circuits on Ceramics IEEE Transactions on Electronics Packing vol. 27, No. 2, Apr. 1, 2004 pp. 109-114.
XP002350486—Hagerg J et al: “Gravure Offset Printing Development for fine line thick flim circuits” Microelectronics International, GB, v18, n3, Sep. 1, 2001, pp. 32-35.

Affiliated with

Also associated with

Rating

Pattern forming apparatus and pattern forming method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Pattern forming apparatus and pattern forming method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pattern forming apparatus and pattern forming method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4262889