Pattern formation method and pattern formation apparatus,...

Details Pattern formation method and pattern formation apparatus,... Pattern formation method and pattern formation apparatus,...

2006-03-07

2006-03-07

Nhu, David (Department: 2818)

Semiconductor device manufacturing: process

Making device or circuit emissive of nonelectrical signal

Including integrally formed optical element

C438S098000, C438S070000

Reexamination Certificate

active

07008809

ABSTRACT:
A pattern formation method for forming a film pattern upon a substrate, including the steps of: forming banks in a predetermined pattern upon the substrate; disposing liquid drops of a functional liquid at the end portions of groove portions which are defined between the banks; and after having disposed the drops at the end portions of the groove portions, disposing liquid drops in positions of the groove portions other than the end portions thereof.

REFERENCES:
patent: 2003/0142167 (2003-07-01), Nakamura et al.
patent: 2003/0151637 (2003-08-01), Nakamura et al.
patent: A 11-274671 (1999-10-01), None
patent: A 2000-216330 (2000-08-01), None

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