Pattern exposure using a polychromatic light source

Details Pattern exposure using a polychromatic light source Pattern exposure using a polychromatic light source

1975-11-06

1977-06-28

Kimlin, Edward C.

Gas separation: apparatus

Electric field separation apparatus

With means to add charged solid or liquid particles to...

96 27R, 96 36, 96 362, 96 384, 96 47, G03C 504, G03C 500

Patent

active

040323412

ABSTRACT:
An exposure method for exposing to a pattern a photosensitive material formed over a substrate having a reflective surface uses a light source having beam components of different wavelengths. The beam from the light source is used to project an exposure pattern upon the photosensitive material through a predetermined mask pattern to thereby form a combined standing wave pattern with the aid of the light beam incident on the photosensitive material and the light beam reflected by the reflective surface. The photosensitive material is disposed in the reduced peak value region of the combined standing wave pattern as the result of the interposition of a transparent layer between the reflecting surface and the photosensitive layer. Thus, the photosensitive material is pattern-exposed to a substantially uniform sensitizing energy.

REFERENCES:
patent: 3576630 (1971-04-01), Yanagawa
patent: 3669732 (1972-06-01), Middelhoek et al.

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