Pattern exposure apparatus with distance measuring system

Details Pattern exposure apparatus with distance measuring system Pattern exposure apparatus with distance measuring system

1985-04-11

1987-04-21

LaRoche, Eugene R.

Optics: measuring and testing

By dispersed light spectroscopy

Utilizing a spectrometer

356363, 355 53, G01B 1102, G03B 2742

Patent

active

046592253

ABSTRACT:
An exposure apparatus wherein a semiconductor wafer is exposed to an IC circuit pattern formed on a mask through a reduction projection optical system, and then the wafer is stepped; and these operations are alternately repeated, thereby forming a plurality of patterns on the wafer. A distance measuring system utilizing the interference between laser beams, has a first mirror fixed relative to the mask and another mirror fixed relative to the wafer, so that the relative position between the mask and the wafer is determined by a single interferometer system.

REFERENCES:
patent: 4443106 (1984-04-01), Yasuda et al.

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