Pattern exposure apparatus using polychromatic light source

Details Pattern exposure apparatus using polychromatic light source Pattern exposure apparatus using polychromatic light source

1977-04-06

1978-04-11

Wintercorn, Richard A.

Photocopying

Projection printing and copying cameras

Illumination systems or details

96 36, 96 362, 96 47, G03B 2776

Patent

active

040836347

ABSTRACT:
An exposure method for exposing to a pattern a photosensitive material formed over a substrate having a reflective surface uses a light source having beam components of different wavelengths. The beam from the light source is used to project an exposure pattern upon the photosensitive material through a predetermined mask pattern to thereby form a combined standing wave pattern with the aid of the light beam incident on the photosensitive material and the light beam reflected by the reflective surface. The photosensitive material is disposed in the reduced peak value region of the combined standing wave pattern as the result of the interposition of a transparent layer between the reflecting surface and the photosensitive layer. Thus, the photosensitive material is pattern-exposed to a substantially uniform sensitizing energy.

REFERENCES:
patent: 3573456 (1971-04-01), Beeh
patent: 3912391 (1975-10-01), Fleisher et al.

Affiliated with

Also associated with

Rating

Pattern exposure apparatus using polychromatic light source does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Pattern exposure apparatus using polychromatic light source, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pattern exposure apparatus using polychromatic light source will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-986685