Image analysis – Image enhancement or restoration – Edge or contour enhancement
Reexamination Certificate
2005-01-04
2005-01-04
Mehta, Bhavesh M. (Department: 2625)
Image analysis
Image enhancement or restoration
Edge or contour enhancement
C382S145000, C382S269000, C382S275000, C356S016000, C358S003260, C358S003270
Reexamination Certificate
active
06839470
ABSTRACT:
A pattern evaluation method includes: scanning an object to be measured on which a pattern has been formed with an energy beam and obtaining an image data of the object by detecting a scattered particle which is produced from the object; recognizing at least one edge of the pattern on the basis of the image data and calculating the coordinate positions of each edge point of a sequence of edge points constituting the shape of the edge of the pattern; deriving a straight line so that the sum of lengths of perpendiculars drawn from the edge points to the straight line is minimum; and statistically processing the lengths of perpendiculars when the straight line is derived and outputting evaluation information for quantitatively expressing roughness of the edge of the pattern.
REFERENCES:
patent: 5386294 (1995-01-01), Ototake et al.
patent: 5481360 (1996-01-01), Fujita
patent: 6613593 (2003-09-01), Tanaka et al.
patent: 6614923 (2003-09-01), Shishido et al.
patent: 6668075 (2003-12-01), Nakamura et al.
patent: 11-257940 (1999-09-01), None
patent: 2000-58410 (2000-02-01), None
Finnegan Henderson Farabow Garrett & Dunner L.L.P.
Kassa Yosef
Mehta Bhavesh M.
LandOfFree
Pattern evaluation method, pattern evaluation system and... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Pattern evaluation method, pattern evaluation system and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pattern evaluation method, pattern evaluation system and... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3392288