Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Analysis and verification
Reexamination Certificate
2011-04-12
2011-04-12
Lin, Sun J (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Design of semiconductor mask or reticle
Analysis and verification
C716S050000, C716S126000, C716S130000
Reexamination Certificate
active
07926005
ABSTRACT:
A method and system for pattern-driven routing are disclosed. Embodiments of pattern-driven routing are disclosed for creating a representation for at least a portion of an initial routing solution, comparing the representation for at least the portion of the initial routing solution with a pattern, and determining whether the initial routing solution has lithographic issues based on the comparison.
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Arifin Taufik
Huang Gang
Li Jianmin
Cadence Design Systems Inc.
Lin Sun J
Vista IP Law Group LLP
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