Pattern drawing method using charged particle beams

Details Pattern drawing method using charged particle beams Pattern drawing method using charged particle beams

1997-11-10

1999-09-28

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430296, 430942, G03F 900

Patent

active

059586362

ABSTRACT:
Each of two pattern scheduled areas to be formed a pattern is divided into two areas of an outer edge section and a central section surrounded by the outer edge section. Further, the outer edge section which is in contact with a space area is divided into outline portions from both end portion of the outer edge section, with a 5 .mu.m distance. An outline portion is formed at a portion of the outer edge section sandwiched by the outline portions. An outline portion is formed at a position of the outer edge section orthogonal with these outline portions. Next, a suitable exposure level to each of the divided outline portions is controlled by a controlling unit based on the intensity of electron beams. In the outer edge section in contact with the space area, the exposure levels of the electron beams at the outline portion which is far away from the outline portion positioned at the center of the outer edge section along the outer edge section are set higher than that of the outline portion which is nearer to the specified outline portion so that the energy irradiation levels of the electron beams become higher at the outline portion which is far away from the center outline portion along the outer edge section.

REFERENCES:
patent: 5667923 (1997-09-01), Kanata
patent: 5736281 (1998-04-01), Watson

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