Pattern developing process and apparatus therefor

Details Pattern developing process and apparatus therefor Pattern developing process and apparatus therefor

1986-08-11

1988-07-05

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430296, 430325, 430326, 156627, G03C 500

Patent

active

047554428

ABSTRACT:
A resist is coated on a photomask and a predetermined pattern is exposed on the resist. The photomask is dipped in a developing solution together with an electrode which exhibits a stable potential in the developing solution, so that a change in current flowing between the photomask and the electrode is detected on the basis of a change in capacitance between the photomask and the developing solution, while developing the pattern formed on the resist. The current abruptly changes (e.g., exhibits its peak) around the time at which the resist is removed and a chromium underlying layer of the photomask is exposed. The time obtained by multiplying the time until the change appears by a predetermined coefficient is regarded as the time corresponding to the end of the developing step.

REFERENCES:
patent: 4621037 (1986-11-01), Kanda et al.

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