Pattern detector

Optics: measuring and testing – By alignment in lateral direction – With registration indicia

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Details

356400, 250548, G01N 2186, G01B 1100

Patent

active

045976694

ABSTRACT:
A pattern detector according to the present invention adopts a processing method wherein means is provided anew with which the intensity distribution of light reflected from or transmitted through an illuminated specimen is photoelectrically converted, and a pattern position is detected at high speed from the ratio between the primary moment and integral value of a detection signal thus derived, whereupon a symmetry calculation is executed within a narrow range around the detected value, whereby the pattern position is found fast and precisely.

REFERENCES:
patent: 3514612 (1970-05-01), Graffenried
patent: 4115762 (1978-09-01), Akiyama et al.
patent: 4380395 (1983-04-01), Kuniyoshi et al.

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