Pattern definition in an organic layer

Details Pattern definition in an organic layer Pattern definition in an organic layer

1974-11-29

1976-06-08

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Methods

Surface bonding and/or assembly therefor

96 351, 96 362, 156 13, 156 17, 427 95, 427259, 427264, 427407, C23F 104

Patent

active

039620042

ABSTRACT:
An improved method of defining a pattern in a layer of organic material includes depositing a relatively thin layer of silicon dioxide on the layer of organic material, applying to the silicon dioxide layer a film of primer solution comprising a silane derivative, and then forming a photoresist etch mask on the film. By utilizing an ultrasonic etch bath, a uniform and well-defined pattern is etched in the layer of organic material.

REFERENCES:
patent: 3405017 (1968-10-01), Gee
patent: 3482977 (1969-12-01), Baker
patent: 3549368 (1970-12-01), Collins et al.

Affiliated with

Also associated with

Rating

Pattern definition in an organic layer does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Pattern definition in an organic layer, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pattern definition in an organic layer will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1096315