Pattern defect inspection method and apparatus

Image analysis – Applications – Manufacturing or product inspection

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382199, 382205, G06K 900

Patent

active

055748007

ABSTRACT:
The pattern edge direction in reference image data of an object to be examined is detected, the reference image data is differentiated using a differential operator in a direction along the pattern edge direction, and inspection image data obtained by picking up an image of the object to be inspected is differentiated using the differential operator in the direction along the pattern edge direction. The differential data obtained by the differential processing are compared with the inspection image data, and a pattern defect on the object to be inspected is detected based on the difference between these data.

REFERENCES:
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patent: 4805123 (1989-02-01), Specht et al.
patent: 4958374 (1990-09-01), Tokita et al.
patent: 5146509 (1992-09-01), Hara et al.
patent: 5157735 (1992-10-01), Maeda et al.
patent: 5185812 (1993-02-01), Yamashita et al.

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