Pattern defect inspection apparatus and method

Details Pattern defect inspection apparatus and method Pattern defect inspection apparatus and method

2006-03-28

2006-03-28

Mehta, Bhavesh M. (Department: 2625)

Image analysis

Applications

Manufacturing or product inspection

C382S144000, C700S110000

Reexamination Certificate

active

07020323

ABSTRACT:
A pattern defect inspection apparatus comprises an image sensor that generates object pattern data corresponding to the pattern of an object, a design data generator that generates design data representing a pattern to be formed on the object, a resizing device which subjects the design data to expansion or shrinkage process to generate resized pattern data, the resizing device detecting a direction of the pattern in a specific region of the design data, aligning the direction of the pattern of the design data with a specific direction, and recognizing and classifying the shape of the pattern of the design data, and a determining device configured to determine the defect of the pattern by comparing the resized pattern data with the object pattern data.

REFERENCES:
patent: 5046109 (1991-09-01), Fujimori et al.
patent: 5850467 (1998-12-01), Matsui et al.
patent: 6504947 (2003-01-01), Nozaki et al.
Watanabe, T., “Pattern Inspection Equipment, Pattern Inspection Method, and Storage Medium Storing Pattern Inspection Program”, U.S. Appl. No. 09/122,779, filed Jul. 27, 1998.

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