Pattern control system

Details Pattern control system Pattern control system

2007-01-30

2007-01-30

Rutledge, D. (Department: 2851)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S053000, C355S072000

Reexamination Certificate

active

11000386

ABSTRACT:
A pattern control system for cooling a wafer prior to a photolithography exposure step. The pattern control system includes a wafer transfer pathway for transferring the wafer in a photolithography process and at least one cooling module provided along the wafer transfer pathway for cooling the wafer. Cooling of the wafers prevents thermal distortion of circuit pattern images formed in a photoresist layer on the wafer during a subsequent photolithography exposure process.

REFERENCES:
patent: 6200432 (2001-03-01), Kobayashi et al.
patent: 6613487 (2003-09-01), Kim et al.
patent: 6907742 (2005-06-01), Kuo

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