Pattern comparison inspection system and method employing gray l

Details Pattern comparison inspection system and method employing gray l Pattern comparison inspection system and method employing gray l

1997-06-02

2000-05-30

Mehta, Bhavesh

Image analysis

Applications

Manufacturing or product inspection

348129, 382218, G06K 900

Patent

active

06069971&

ABSTRACT:
A pattern comparison inspection system includes: an occupancy calculating portion for dividing pattern data into pixel regions and calculating a ratio of divided pattern data to a pixel region; a gray level bit map generating portion for generating a gray level bit map based on the ratio of the divided pattern data; and a bit map comparing portion for making a comparison between a gray level bit map for design pattern data and a gray level bit map for pattern data for an electron beam patterning system both generated by the occupancy calculating portion and the gray level bit map generating portion to determine whether the pattern data for an electron beam patterning system matches the design pattern data.

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patent: 5048094 (1991-09-01), Aoyama et al.
patent: 5095511 (1992-03-01), Okazaki
patent: 5396584 (1995-03-01), Lee et al.
Kenneth Levy, "Automated Equipment for 100% Inspection of Photomasks", Solid State Technology, May 1978, pp. 60-66 and 71.
"VLSL mask Data Comparison Inspection System", M. Kanno et al., Mitsubishi Denki Giho vol. 68, No. 3, 1994 pp. 86-89 and 114.

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