Pattern alignment system and method

Details Pattern alignment system and method Pattern alignment system and method

1982-04-07

1985-05-07

Rosenberger, R. A.

Optics: measuring and testing

By alignment in lateral direction

With light detector

356394, 358139, G01B 1100

Patent

active

045154805

ABSTRACT:
A pattern recognition system for providing automatic alignment capability for a semiconductor wafer or other object. The system includes an integrator for electronically smearing input data representing the reflected light level of a scanned object, means for digitizing the smeared data, and processor means for determining the best match between the smeared, digitized data and predetermined stored data, thereby representing proper alignment of the wafer or other object.

REFERENCES:
patent: 4097750 (1977-03-01), Lewis et al.
patent: 4203132 (1980-05-01), Schmitt et al.
patent: 4233625 (1980-11-01), Altman
patent: 4242702 (1980-12-01), Kuni et al.

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