Pattern alignment mark of semiconductor device

Details Pattern alignment mark of semiconductor device Pattern alignment mark of semiconductor device

1995-07-07

1997-10-07

Font, Frank G.

Optics: measuring and testing

By alignment in lateral direction

356400, G01B 1100

Patent

active

056754183

ABSTRACT:
A pattern alignment mark equipped with at least one designated measuring pattern for an alignment during the process of fabrication of semiconductor devices, a means for attenuating light reflection on the pattern with higher light reflection intensity among said designated measuring patterns, said attenuating means preventing the occurrence of a pattern alignment error due to the differences in the light reflection intensities while measuring the overlay accuracy of patterns, thus enhancing the yield and reliability of fabrication by achieving the stabilization of the process and the reduction of the process time.

REFERENCES:
patent: 4769551 (1988-09-01), Hamashima
patent: 4880309 (1989-11-01), Wanta
patent: 5170293 (1992-12-01), Tanimoto
patent: 5333050 (1994-07-01), Nose

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