Passive probe employing cluster of charge monitors for determini

Details Passive probe employing cluster of charge monitors for determini Passive probe employing cluster of charge monitors for determini

1995-02-14

1997-01-14

Wieder, Kenneth A.

Electricity: measuring and testing

Testing potential in specific environment

Voltage probe

257379, H01L 2702

Patent

active

055943284

ABSTRACT:
The current density versus voltage characteristics of integrated circuit processing equipment such as a plasma etcher are determined using a passive probe including a semiconductor wafer in which one or more clusters of individual passive charge monitors are fabricated. Each monitor includes an EEPROM device having a control electrode and a floating electrode over a channel region connecting source and drain regions, a charge collecting electrode connected to the control electrode, and a current sensing resistor connecting the charge collection electrode to the substrate for developing a threshold varying voltage. By determining changes in device threshold voltage, a corresponding surface-substrate potential is determined which can be divided by the value of the current-sensing resistor to yield a current. The current can then be divided by the area of the charge collecting electrode to yield a value of the current density. A single charge flux monitor thus yields one point on the J-V characteristic curve of the monitored charging source.

REFERENCES:
patent: 5315145 (1994-05-01), Lukaszek
Lukaszek et al., Characterization of Wafer Charging Mechanisms and Oxide Survival Prediction Methodology, Presentation at 1993 International Integrated Reliability Workshop, Lake Tahoe, California, Oct. 24-27, 1993, pp. 131-136.
Lukaszek et al., Characterization of Wafer Charging Mechanisms and Oxide Survival Prediction Methodology, Presentation at 1994 International Reliability Physics Symposium, San Jose, California, Apr. 12-14, 1994, pp. 334-338.

Affiliated with

Also associated with

Rating

Passive probe employing cluster of charge monitors for determini does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Passive probe employing cluster of charge monitors for determini, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Passive probe employing cluster of charge monitors for determini will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1390745