Passive gas flow management and filtration device for use in...

Coherent light generators – Particular active media – Gas

Reexamination Certificate

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Details

C372S055000, C372S059000, C372S098000

Reexamination Certificate

active

06973112

ABSTRACT:
The present invention provides systems and methods for filtering particles and assisting gas flow management within laser systems. In one embodiment, a laser apparatus (100) includes an elongate laser chamber defining a chamber cavity (130) and an electrode structure (140) disposed therein. The electrode structure includes an anode (148) spaced apart from a cathode (146). The laser includes an elongate baffle (174) disposed in the laser chamber. The baffle is adapted to arrest a plurality of particles generated within the chamber. In this manner, the baffle operates as a passive filtration system to help filter particles generated within the chamber during laser operation, and may further provide gas flow management capabilities.

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ERG Materials and Aerospace Corporation Nov. 13, 2002, p. 1-3.
ERG Materials and Aerospace Corporation website entitled: “DUOCEL Foam Metal for Semiconductor Applications” at http://ergaerospace.com/semi.htm, printed Nov. 13, 2002.

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