Compositions – Etching or brightening compositions
Reexamination Certificate
2007-11-27
2007-11-27
Norton, Nadine G. (Department: 1765)
Compositions
Etching or brightening compositions
C252S079200, C252S079400, C438S692000
Reexamination Certificate
active
10315641
ABSTRACT:
A CMP composition containing 5-aminotetrazole, e.g., in combination with oxidizing agent, chelating agent, abrasive and solvent. Such CMP composition advantageously is devoid of BTA, and is useful for polishing surfaces of copper elements on semiconductor substrates, without the occurrence of dishing or other adverse planarization deficiencies in the polished copper, even in the presence of substantial levels of copper ions, e.g., Cu2+, in the bulk CMP composition at the copper/CMP composition interface during CMP processing.
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Bernhard David
Boggs Karl
Darsillo Michael
King MacKenzie
Liu Jun
Advanced Technology & Materials Inc.
Chappuis Maggie
Fuierer Tristan A.
Moore & Van Allen PLLC
Norton Nadine G.
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