Passivation/patterning of PZR diamond films for high temperature

Details Passivation/patterning of PZR diamond films for high temperature Passivation/patterning of PZR diamond films for high temperature

1996-10-09

1998-05-12

Dougherty, Elizabeth L.

Measuring and testing

Fluid pressure gauge

Diaphragm

73721, 437901, 437921, G01L 906

Patent

active

057508984

ABSTRACT:
A method for passivating diamond films to substantially prevent them from oxidizing at temperatures up to 800.degree. C. in an oxygen atmosphere. The method involves depositing one or more passivating layers over the diamond film wherein one of the layers is nitride and the other layer is quartz. The passivation technique is directly applicable to diamond sensor pressure transducers and enable them to operate at temperatures above 800.degree. C. in oxygen environments. The passivation technique also provides an economical and simple method for patterning diamond films.

REFERENCES:
patent: 4912548 (1990-03-01), Shanker et al.
patent: 5506422 (1996-04-01), Dreifus et al.

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