Passivation of RIE patterned al-based alloy films by etching to

Details Passivation of RIE patterned al-based alloy films by etching to Passivation of RIE patterned al-based alloy films by etching to

1981-06-30

1983-01-11

Massie, Jerome W.

Coating processes

Coating by vapor, gas, or smoke

Base supplied constituent

134 3, 156643, 156665, 156667, 427309, 427318, 427327, 427399, H01L 21283, H01L 21306

Patent

active

043682200

ABSTRACT:
Aluminum-based alloy films and metallization layers that are patterned by reactive ion etching (RIE) are passivated by etching surface portions of the films or layers with a phosphoric-chromic mixture to remove contaminants and then oxidizing the exposed surface portions in an oxygen atmosphere.

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J. Appl. Physics 52(4) Apr. 1981, pp. 2994-2999, Lee et al., "Reactive Ion Etching Induced Corrosion of Al and Al-Cu Films".

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