Parylene deposition chamber

Details Parylene deposition chamber Parylene deposition chamber

1988-06-23

1990-08-07

Bueker, Richard

Coating apparatus

Gas or vapor deposition

118728, 118730, 4272555, 4272556, C23C 1600

Patent

active

049458566

ABSTRACT:
Disclosed is a parylene deposition chamber wherein reactive monomer vapors enter the chamber tangentially so as to create a rotational flow of vapor within the interior of the chamber. A substrate support fixture is positioned within the chamber and rotated in a direction counter to the rotational flow of vapor. An annular space exists between the outer edge of the fixture and the inner wall of the chamber so as to allow the rotating vapor to descend freely within the chamber. Waste of parylene chemicals is minimized by eliminating the need for the positioning of baffles within the chamber.

REFERENCES:
patent: 3288728 (1966-11-01), Gorham
patent: 3300332 (1967-01-01), Gorham et al.
patent: 3342754 (1967-09-01), Gorham
patent: 3472795 (1969-10-01), Tittman et al.
patent: 3503903 (1970-03-01), Shaw et al.
patent: 3600216 (1971-08-01), Stewart
patent: 3719166 (1973-03-01), Gereth
patent: 3895135 (1975-07-01), Hofer
patent: 4508054 (1985-04-01), Baumberger et al.
patent: 4649859 (1987-03-01), Wanlass
Brochure-Union Carbide, re: Parylene Deposition Systems, 1979.

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