Coating apparatus – Gas or vapor deposition – Multizone chamber
Patent
1995-10-27
1996-07-09
Bueker, Richard
Coating apparatus
Gas or vapor deposition
Multizone chamber
118715, 118724, 118725, 118726, 118728, 4272556, C23C 1600
Patent
active
055340687
ABSTRACT:
A parylene deposition apparatus is provided for the quick and efficient deposition of Parylene AF4 onto silicon wafers in the production of semiconductor chips. The apparatus includes a frusto-conical shaped deposition chamber which minimizes deposition chamber volume and maximizes flow of vapor over the surface of the wafer, and a vacuum by-pass assembly wherein a high-conductance vacuum outlet is utilized to quickly reduce pressure in the vacuum chamber system and a low-conductance vacuum manifold outlet is utilized to maintain vacuum flow during the deposition procedure.
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Beach William F.
Olson Roger A.
Wary John
Bueker Richard
Specialty Coating Systems Inc.
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