Parylene deposition apparatus including a post-pyrolysis filteri

Details Parylene deposition apparatus including a post-pyrolysis filteri Parylene deposition apparatus including a post-pyrolysis filteri

1995-10-27

1996-07-16

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Multizone chamber

118715, 118722, 118725, 118726, 118728, 4272556, C23C 1600

Patent

active

055363210

ABSTRACT:
Chemical vapor deposition apparatus is provided for the quick and efficient deposition of Parylene AF4 onto silicon wafers in the production of semiconductor chips. The apparatus includes a post-pyrolysis chamber maintained at a predetermined temperature for capturing unpyrolyzed dimer before entry into the deposition chamber, and a filter structure positioned at the deposition chamber inlet to filter out microscopic particles and impurities prior to deposition onto the wafer surface. The post-pyrolysis chamber includes baffles for capturing the unpyrolyzed dimer, and the filter material preferably comprises PTFE. The filter element is heated to prevent deposition onto the filter.

REFERENCES:
patent: 3472795 (1969-10-01), Tittmann et al.
patent: 4495889 (1985-01-01), Riley
patent: 4518623 (1985-05-01), Riley
patent: 4683143 (1987-07-01), Riley
patent: 5007372 (1991-04-01), Hattori et al.
patent: 5123375 (1992-06-01), Hansen
patent: 5268033 (1993-12-01), Stewart

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