Parylene deposition apparatus including a heated and cooled dime

Details Parylene deposition apparatus including a heated and cooled dime Parylene deposition apparatus including a heated and cooled dime

1995-10-27

1998-01-20

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Multizone chamber

118724, 118725, 118726, C23C 1600

Patent

active

057097534

ABSTRACT:
Chemical vapor deposition apparatus is provided for the quick and efficient deposition of Parylene AF4 onto silicon wafers in the production of semiconductor chips. The apparatus includes a heated and cooled dimer receptacle for fast and efficient vaporization of parylene dimer material.

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