Particulate trap for vertical furnace

Details Particulate trap for vertical furnace Particulate trap for vertical furnace

1993-07-16

1994-05-17

Yuen, Henry C.

Heating

Shaft type

432241, 432152, F27B 1500, F27D 300

Patent

active

053122453

ABSTRACT:
A contaminant trap for a high temperature, vertical furnace of the type used in semiconductor fabrication processing. The trap is designed to reduce particulate deposition within the process chamber, thereby decreasing the likelihood of by-product contamination of the wafers. The trap includes a housing having at least one sidewall, a bottom wall and a top wall which together define an inner compartment. The housing is attached to the exhaust port of the process chamber such that exhaust by-products in the process chamber may not be evacuated through the exhaust port around the housing. The housing has an input opening in the sidewall through which exhaust by-products pass from the process chamber into the inner compartment. An output opening extends through the sidewall near the top wall through which exhaust by-products are subsequently removed from the interior compartment of the housing. When the housing is attached to the exhaust port, the bottom wall of the housing collects particulate resulting from deposition of exhaust by-products within the interior compartment of the housing, thereby preventing the collected particulate from becoming contaminant within the process chamber.

REFERENCES:
patent: 3841828 (1974-10-01), Cooper
patent: 4007014 (1977-02-01), Matsumoto et al.
patent: 4223048 (1980-09-01), Engle, Jr.
patent: 4323366 (1982-04-01), Staudinger
patent: 4845334 (1989-07-01), Stocks et al.
patent: 5000682 (1991-02-01), Philipossian

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