Particulate thin film fabrication process

Coating processes – Electrical product produced – Photoelectric

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427 85, 427 86, 427 87, 427 91, 4272481, 427250, 427255, 427251, 4272555, 136258, B05D 512, H01L 31363, H01L 21363

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active

043328385

ABSTRACT:
A method for the fabrication of large surface area thin films of vaporizable solids upon substrate materials is provided. The method is particularly applicable to the fabrication of thin films having semiconducting properties useful as solar cells, in the production of microelectronic devices, and other similar purposes. A solid material is vaporized in a temperature-zoned furnace in association with a flowing carrier gas. The vaporized solid is allowed to condense to form an aerosol of disperse sized particles; the smaller of these particles are again vaporized leaving a lesser number of seed aerosol nuclei which are then grown to a larger size and diverted through an orifice to impact upon a substrate moving beneath the orifice thereby forming a particulate film on the substrate.

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Loferski-"Photovoltaics 1: solar-cell arrays"; Wolf-Photovoltaics II: flat panels; Backus-Photovoltaics III: concentrators; Loferski-Photovoltaics IV: advanced materials; and Carlson-Photovoltaics V: amorphous silicon cells-IEEE Spectrum, Feb. 1980 pp. 26-41.
Ehrenreich et al, "Solar photovoltaic energy", Physics Today, Sep. 1979 pp. 25-32.
"Crystalline thin film grows on amorphous base", Physics Today, Amorphous-silicon doping brightens solar-cell picture", Physics Today, Jan. 1977 pp. 17-19.
"New uses for amorphous silicon", pp. 1-3.

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