Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing
Reexamination Certificate
2005-08-23
2005-08-23
Nguyen, Ngoc-Yen (Department: 1754)
Chemistry of inorganic compounds
Silicon or compound thereof
Oxygen containing
C423S335000, C423S336000
Reexamination Certificate
active
06932953
ABSTRACT:
Particulate silica is prepared by feeding a gas mixture of an organohalosilane gas, a flammable gas capable of generating water vapor when burned, and a free oxygen-containing gas to a reaction chamber through a multiple-tube burner, whereby the organohalosilane is subjected to flame hydrolysis and oxidation reaction. The amount of the flammable gas fed is 0.5-9 mol per mol of the organohalosilane and such that the amount of water vapor resulting from combustion of the flammable gas is 1-6 times the stoichiometric amount, and the gas mixture is fed to the center tube of the burner such that it may have a linear velocity at the outlet of 50-120 m/sec, calculated in the standard state. The resulting silica has a surface area of 100-400 m2/g and a narrow particle size distribution of primary particles and ensures the transparency of silicone rubber filled therewith.
REFERENCES:
patent: 2823982 (1958-02-01), Saladin et al.
patent: 3361525 (1968-01-01), De Rycke et al.
patent: 3954945 (1976-05-01), Lange et al.
patent: 4108964 (1978-08-01), Kratel et al.
patent: 4258023 (1981-03-01), Schmid et al.
patent: 4565682 (1986-01-01), Loskot et al.
patent: 4801437 (1989-01-01), Konagaya et al.
patent: 5123836 (1992-06-01), Yoneda et al.
patent: 5340560 (1994-08-01), Rohr et al.
patent: 5855860 (1999-01-01), Nishimine et al.
patent: 6322765 (2001-11-01), Muhlhofer et al.
patent: 6588230 (2003-07-01), Adler et al.
patent: 0 044 903 (1982-02-01), None
patent: 0 706 972 (1996-04-01), None
patent: 0790213 (1997-08-01), None
patent: 1 345 178 (1962-11-01), None
patent: 2049641 (1980-03-01), None
patent: 47-46274 (1972-11-01), None
patent: 56-38526 (1981-09-01), None
patent: 58-54085 (1983-12-01), None
patent: 2889202 (1999-02-01), None
Iwase Tomio
Koike Tomoyoshi
Nishimine Masanobu
Sezai Michiaki
Tanifuji Yoichi
Birch & Stewart Kolasch & Birch, LLP
Nguyen Ngoc-Yen
Shin-Etsu Chemical Co. , Ltd.
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