Particulate removal from point of use exhaust scrubbers

Details Particulate removal from point of use exhaust scrubbers Particulate removal from point of use exhaust scrubbers

1993-10-05

2000-08-08

Warden, Sr., Robert J.

Chemical apparatus and process disinfecting, deodorizing, preser

Chemical reactor

Waste gas purifier

96 28, 96 53, 96 57, B01D 5000, B03C 316, B03C 301

Patent

active

060998083

ABSTRACT:
A submicron filter assembly (24) is added to an exhaust gas controlled destruction and oxidation unit (10). Controlled destruction and oxidation unit (10) treats exhaust gas from at least one semiconductor wafer fabricating reactor. The submicron filter (24) filters submicron particles out of the treated exhaust gas to prevent visible plumes from forming in wafer fab exhaust systems (stacks). The controlled destruction and oxidation unit (10) and submicron filter assembly (24) are ideally suited for use at the point of generation of the exhaust gases. In one embodiment of the invention, the submicron filter assembly comprises an electrostatic filter (26). The electrostatic filter (26) includes a positively charged first grid (28) and a grounded second grid (30). The second grid may include a mist screen for removing particulate build-up. In another embodiment of the invention, the submicron filter assembly (36) comprises a mist eliminator (38) and a HEPA filter (40).

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patent: 5176088 (1993-01-01), Amrhein et al.
patent: 5250267 (1993-10-01), Johnson et al.

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