Particulate or particle-bound chelating agents

Details Particulate or particle-bound chelating agents Particulate or particle-bound chelating agents

2003-10-23

2008-09-23

Chen, Kin-Chan (Department: 1792)

Compositions

Etching or brightening compositions

C438S692000

Reexamination Certificate

active

07427361

ABSTRACT:
The invention generally relates to compositions and methods for chemically mechanically polishing a substrate, including a polishing accelerator, which is normally one or more oxidizers, an abrasive material, and chelating particles and/or metal-absorbent clay material. In addition, the invention can also involve methods of forming chelator particles and methods of separating metal-containing ions from polishing and/or etching solutions after polishing and/or etching.

REFERENCES:
patent: 4732887 (1988-03-01), Obanawa et al.
patent: 4752628 (1988-06-01), Payne
patent: 4867757 (1989-09-01), Payne
patent: 4904634 (1990-02-01), Wieserman et al.
patent: 5123958 (1992-06-01), Wiand
patent: 5334332 (1994-08-01), Lee
patent: 5352277 (1994-10-01), Sasaki
patent: 5417877 (1995-05-01), Ward
patent: 5429708 (1995-07-01), Linford et al.
patent: 5447603 (1995-09-01), Michalowski et al.
patent: 5482566 (1996-01-01), Lee
patent: 5489233 (1996-02-01), Cook et al.
patent: 5498565 (1996-03-01), Gocho et al.
patent: 5672577 (1997-09-01), Lee
patent: 5721173 (1998-02-01), Yano et al.
patent: 5750070 (1998-05-01), Tang et al.
patent: 5860848 (1999-01-01), Loncki et al.
patent: 5876490 (1999-03-01), Ronay
patent: 5902780 (1999-05-01), Lee
patent: 5938505 (1999-08-01), Morrison et al.
patent: 5958794 (1999-09-01), Bruxvoort et al.
patent: 5981454 (1999-11-01), Small
patent: 5991835 (1999-11-01), Mashimo et al.
patent: 6000411 (1999-12-01), Lee
patent: 6019806 (2000-02-01), Sees et al.
patent: 6099604 (2000-08-01), Sandhu et al.
patent: 6110881 (2000-08-01), Lee et al.
patent: 6117220 (2000-09-01), Kodama et al.
patent: 6117775 (2000-09-01), Kondo et al.
patent: 6117783 (2000-09-01), Small et al.
patent: 6121217 (2000-09-01), Lee
patent: 6132637 (2000-10-01), Hosali et al.
patent: 6140287 (2000-10-01), Lee
patent: 6156661 (2000-12-01), Small
patent: 6171352 (2001-01-01), Lee et al.
patent: 6187730 (2001-02-01), Lee
patent: 6221818 (2001-04-01), Lee
patent: 6276372 (2001-08-01), Lee
patent: 6303049 (2001-10-01), Lee et al.
patent: 6346195 (2002-02-01), Filson et al.
patent: 6354913 (2002-03-01), Miyashita et al.
patent: 6367486 (2002-04-01), Lee et al.
patent: 6443811 (2002-09-01), Nojo et al.
patent: 6514821 (2003-02-01), Huang
patent: 6540935 (2003-04-01), Lee et al.
patent: 6561876 (2003-05-01), Tateyama et al.
patent: 6616514 (2003-09-01), Edelbach et al.
patent: 2003/0017785 (2003-01-01), Ueda et al.
patent: 2003/0124959 (2003-07-01), Schoeder et al.
patent: 1 036 836 (2000-09-01), None
patent: 1 104 778 (2001-06-01), None
patent: 1 118 647 (2001-07-01), None
patent: 64-87146 (1989-03-01), None
patent: WO 99/64527 (1999-12-01), None
patent: WO 01/02134 (2001-01-01), None
patent: WO 01/14496 (2001-03-01), None
“Slurry Engineering for Self-Stopping, Dishing Free SIO2-CMP” by Nojo et al., IEEE, 1996 IEDM 96-349-352.

Affiliated with

Also associated with

Rating

Particulate or particle-bound chelating agents does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Particulate or particle-bound chelating agents, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Particulate or particle-bound chelating agents will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3985841