Particulate material processing apparatus and particulate...

Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – Including solid reactant and means charging solids into – or...

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C422S129000, C422S139000

Reexamination Certificate

active

08007736

ABSTRACT:
A particulate material processing apparatus has a vessel, a processing tank, and a dispersing member. The vessel has a charging port for charging a particulate material into the vessel. The processing tank receives the particulate material charged from the charging port. The processing tank is shaped so as to narrow towards the bottom. At least the lower part of the processing tank is made of a gas-permeable material that allows the process gas for processing the particulate material to pass through. The dispersing member is disposed below the charging port. The dispersing member disperses and flattens the particulate material on the processing tank.

REFERENCES:
patent: 4610218 (1986-09-01), Johnson et al.
patent: 6574885 (2003-06-01), Pospisil et al.
patent: 6945287 (2005-09-01), Anderson
patent: 2009/0126571 (2009-05-01), Isogai et al.
patent: 56166204 (1981-12-01), None
patent: 05-240581 (1993-09-01), None
patent: 2000-327379 (2000-11-01), None
patent: WO 01/25121 (2001-04-01), None
English translation of JP 56-166204 A, which was published Dec. 21, 1981.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Particulate material processing apparatus and particulate... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Particulate material processing apparatus and particulate..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Particulate material processing apparatus and particulate... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2784122

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.