Particle shielded R. F. connector for a plasma enhanced chemical

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

156643, 118723, 118 501, 118504, H01J 3700, C23C 1600

Patent

active

048203700

ABSTRACT:
The wafer processing boat of a plasma enhanced chemical vapor processor includes an R.F. connector at the inner end of its interleaved electrodes. The R.F. electrical connector includes slidably mated male and female portions for making R.F. electrical connection to the boat through the end wall of the evacuable furnace tube. A particle shield surrounds the mated male and female R.F. connector portions for confinement of particulates released during the mating of the connector. The shield includes an open end which faces downstream of the flow of processing gases to reduce backstreaming of particulates onto the wafers. The electrical male conductors of the connector are covered by a quartz sheath.

REFERENCES:
patent: 2228237 (1941-01-01), Sofield et al.
patent: 2877437 (1959-03-01), Flanagan
patent: 3588789 (1971-06-01), Kailus
patent: 4223048 (1980-09-01), Engle, Jr.
patent: 4448149 (1984-05-01), Brown et al.
patent: 4508053 (1985-04-01), Eriksson
patent: 4625678 (1986-12-01), Shioya et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Particle shielded R. F. connector for a plasma enhanced chemical does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Particle shielded R. F. connector for a plasma enhanced chemical, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Particle shielded R. F. connector for a plasma enhanced chemical will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-664929

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.