Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate
2006-05-16
2006-05-16
Fourson, George (Department: 2823)
Semiconductor device manufacturing: process
Chemical etching
Vapor phase etching
C156S345290, C156S345300
Reexamination Certificate
active
07045465
ABSTRACT:
In a semiconductor device manufacturing apparatus that processing a substrate by applying a voltage to a gas to create a plasma, positively charged particles are trapped or guided at the instant that the cathode voltage is stopped, by an electrode to which is imparted a negative voltage, so as to prevent particles reaching the substrate.
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Ito Natsuko
Moriya Tsuyoshi
Uesugi Fumihiko
Fourson George
Muirhead and Saturnelli LLC
NEC Electronics Corporation
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