Radiant energy – Electrically neutral molecular or atomic beam devices and...
Reexamination Certificate
2005-10-20
2008-08-19
Berman, Jack I. (Department: 2881)
Radiant energy
Electrically neutral molecular or atomic beam devices and...
C250S492200, C250S492230, C355S030000, C355S075000, C355S067000, C430S002000, C430S296000
Reexamination Certificate
active
07414240
ABSTRACT:
A particle remover includes an irradiation unit for irradiating plural lights onto a target from different directions, and for scanning the lights on the target, and a collector for collecting particles carried as a result of scanning of the lights.
REFERENCES:
patent: 6038015 (2000-03-01), Kawata
patent: 2002/0029956 (2002-03-01), Allen
patent: 2006/0077361 (2006-04-01), Sogard
patent: 5-100182 (1993-04-01), None
Tam et al, “Laser-cleaning techniques for removal of surface particulates,” J. Appl. Phys. 71(7). pp. 3515-3523, Apr. 1, 1992.
Svoboda, et al, Optical trapping of metallic Raleigh particles;: Optical Letters, vol. 19, No. 13, pp. 930-932, Jul. 1, 1994.
Arthur Ashkin, “Optical trapping and manipulation of neural particles using lasers,” Proc. Natl. Acad. Sci. U.S.A., vol. 94 pp. 4853-4860 (1997).
Moors et al, “Electrostatic mask protection for extreme ultraviolet lithography”, Journal of Vacuum Science & Technology B, vol. 20, No. 1, pp. 316-320 (2002).
Rader et al, “Verification studies of thermophoretic protection of EUV masks,” Emerging Lithographic Technologies VI, SPIE Proceedings vol. 468 pp. 182-193, (2002).
Ohkubo Akinori
Osawa Hiroshi
Yamazoe Kenji
Berman Jack I.
Canon Kabushiki Kaisha
Morgan & Finnegan , LLP
Sahu Meenakshi S
LandOfFree
Particle remover, exposure apparatus having the same, and... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Particle remover, exposure apparatus having the same, and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Particle remover, exposure apparatus having the same, and... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3995224