Cleaning and liquid contact with solids – Processes – For metallic – siliceous – or calcareous basework – including...
Reexamination Certificate
2011-06-14
2011-06-14
Mruk, Brian P (Department: 1761)
Cleaning and liquid contact with solids
Processes
For metallic, siliceous, or calcareous basework, including...
C134S038000, C134S039000, C134S041000, C134S042000, C510S165000, C510S166000, C510S167000, C510S168000, C510S170000, C510S175000, C510S423000, C510S434000, C510S476000, C510S499000, C510S504000
Reexamination Certificate
active
07959739
ABSTRACT:
A cleaning solution and method for removing submicron particles from the surface and/or the bevel of an electronic substrate such as a hard disk media substrate, or an imprint mold used in the manufacturing of the hard disk media or a read/write head assembly part. The cleaning solution comprises a polycarboxylate polymer or an ethoxylated polyamine. The method comprises the step of contacting a surface of the substrate with a cleaning solution comprised of a polycarboxylate polymer or an ethoxylated polyamine. Additional optional steps in the method include applying acoustic energy to the cleaning solution and/or rinsing the surface with a rinsing solution with or without the application of acoustic energy to the rinsing solution.
REFERENCES:
patent: 2002/0072482 (2002-06-01), Sachdev et al.
patent: 2002/0189635 (2002-12-01), Bodet et al.
patent: 2003/0144163 (2003-07-01), Morinaga et al.
patent: 2009/0056744 (2009-03-01), Carswell
Fontana Technology
Mruk Brian P
Pagel Donald J.
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