Particle removal apparatus and method and plasma processing...

Details Particle removal apparatus and method and plasma processing... Particle removal apparatus and method and plasma processing...

2009-12-07

2011-11-08

Kornakov, Michael (Department: 1714)

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

C134S001300, C134S021000, C134S022180

Reexamination Certificate

active

08052798

ABSTRACT:
A particle removal apparatus for removing particles from a chamber of a plasma processing apparatus, wherein the chamber is connected to a gas exhaust port and a plasma of a processing gas is generated in the chamber to plasma process a substrate to be processed, includes a particle charging control member for positively charging particles generated within the chamber by positive ions of an ion sheath region formed in a region other than the vicinity of the substrate to be processed, wherein positively charged particles are discharged from the chamber via the gas exhaust port. Therefore, there is no plasma disturbance or metal contamination, and thus can be applied to a practical use.

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English Machine Translation of Japanese Kokai 10-321604 A to Koga. Obtained Oct. 16, 2008 from http://www19.ipdl.inpit.go.jp/PA1/cgi-bin/PA1DETAIL.

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