Particle or radiation beam mask and process for making same

Details Particle or radiation beam mask and process for making same Particle or radiation beam mask and process for making same

1988-06-10

1990-01-02

Wieder, Kenneth

Electric lamp and discharge devices

Cathode ray tube

Shadow mask, support or shield

2505051, 445 29, 445 47, H01J 2907, G01J 100

Patent

active

048915475

ABSTRACT:
The mask of our invention can be used in image forming units, for example in ion projection microlithography. The mask comprises a mask foil clamped into a retaining frame. The mask foil has a larger thermal expansion coefficient than the retaining frame. To make this mask the mask foil and retaining frame are heatead to a higher temperature than room temperature and clamped in position at this temperature.

REFERENCES:
patent: 2625734 (1953-01-01), Law
patent: 3271488 (1966-09-01), Dahlberg
patent: 3936691 (1976-02-01), Bakker et al.
patent: 4370556 (1983-01-01), Stengl et al.
patent: 4536226 (1985-08-01), Ohtake et al.
Stengl et al., "Electron-beam, X-ray, and Ion Beam Techniques For Submicrometer Lithographics", The Int. Soc. for Optical Eng., IV V.1537, pp. 138-145, May 14-15, 1985.
Burggraaf, Editor, "Research in Ion Projection Lighography", Semiconductor International, In-Depth News, Jul. 1985.
Stengl et al., "Ion Projection System for IC Production," J. Vac. Sci. Technol., 16(6), Nov./Dec. 1979, pp. 1883-1885.
Stengl, "Ion Projection Microlithography For Submicron Device Fabrication", J. Vacuum Science Tech., vol. 19, No. 1 May/Jun. 1981, pp. 1164-1165.
Stengl et al., "Ion Projection Microlithography", Microcircuit Engineering 81, Int. Conf. on Microlithography, Switzerland, Sep. 28-30, 1981.
Stengl et al., "Ion Projection Microlithography", Solid State Technology, Aug. 1982, vol. 25, No. 8, pp. 104-109.
Vacuum Science & Technology, vol. 19, No. 4, Nov., Dec. 1981, Edit: G. Lucovsky; pub. for the American Vacuum Society by the American Institute of Physics, 81, pp. 1164-1165.

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