Particle-optical appliance provided with...

Radiant energy – With charged particle beam deflection or focussing – Magnetic lens

Reexamination Certificate

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C250S3960ML, C250S397000, C250S398000

Reexamination Certificate

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11397480

ABSTRACT:
Quadrupole-octupole aberration corrector for application in a TEM, STEM or SEM. A known corrector for correcting third-order and fifth-order aberrations of the objective is embodied with eight quadrupoles and three octupoles. The corrector according to the invention has at least the same aberration-correcting power, but, according to the invention, is embodied with six quadrupoles and three octupoles. By adding octupoles with a relatively weak excitation to a portion of the quadrupoles, correction of the anisotropic coma of the objective lens is also attained. By embodying all quadrupoles, or a portion thereof, to be electromagnetic, chromatic aberrations can also be corrected for.

REFERENCES:
patent: 2919381 (1959-12-01), Glaser
patent: 6888145 (2005-05-01), Muller et al.
patent: 7012262 (2006-03-01), Rose
patent: 2004/0004192 (2004-01-01), Krivanek et al.
H. Koops, “Aberration Correction in Electron Microscopy,” The Instrument Today and Tomorrow, Ninth International Congress on Electron Microscopy, Toronto, p. 185-196, date unavailable.
M. Haider, S. Uhlemann, J. Zach, “Upper Limits for the Residual Aberrations of a High-Resolution Aberration-Corrected Stem,” Ultramicroscopy 81 (2000), p. 163-175.

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