Particle monitoring instrument

Details Particle monitoring instrument Particle monitoring instrument

1997-12-12

1999-01-19

Pham, Hoa Q.

Optics: measuring and testing

By particle light scattering

With photocell detection

356339, G01N 2100

Patent

active

058619518

ABSTRACT:
When a intensity of a signal from a light detector 14 to measure a scattered light exceeds a predetermined value, a motion of a particle 20 is displayed as a locus of the scattered light, by means of extending an exposure time of the scattered light to the light detector, or by means of increasing a pulse oscillation frequency of a laser beam 13, or by means of extending a pulse width of the laser light. And then a straight line connecting start and terminal points of the locus is displayed to superimpose on the locus. An origin of the particle is estimated by extending the straight line beyond the start point, and a destination point of the particle is estimated by extending the straight line beyond the terminal point. A mass of the particle is estimated by dividing a projective length of the straight line in a vertical direction by the exposure time of the scattered light.

REFERENCES:
patent: 5153674 (1992-10-01), Bobel et al.
patent: 5316983 (1994-05-01), Fujimori et al.
Gary S. Selwyn, "Plasma particulate contamination control. I. Transport and process effects", J. Vac. Sci. Technol., B9 (6), Nov./Dec. 1991, pp. 3487-3492.
Shiratani et al., "In situ polarization-sensitive laser-light-scattering method for simultaneous . . . particles in plasmas", J. Vac. Sci. Technol., A14 (2), Mar./Apr. 1996, pp. 603-607.
Watanabe et al., "Observation of growing kinetics of particles in a helium-diluted silane rf plasma", Appl. Phys. Lett., 61 (13), Sep. 28, 1992, pp. 1510-1512.
Selwyn et al., "Particle contamination characterization in a helicon plasma etching tool", J. Vac. Sci. Technol., A14 (2), Mar./Apr. 1996, pp. 649-654 .

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