Optics: measuring and testing – By particle light scattering – With photocell detection
Reexamination Certificate
2008-01-04
2010-12-14
Pham, Hoa Q (Department: 2886)
Optics: measuring and testing
By particle light scattering
With photocell detection
C250S574000
Reexamination Certificate
active
07852476
ABSTRACT:
A particle monitor system capable of accurately detecting the number of or the size of particles flowing through an exhaust pipe. In a bypass line through which a chamber is communicated with a dry pump, there is disposed the particle monitor system that includes a laser oscillator for irradiating laser light, a photo multiplier tube having a focal point thereof located at a location where the center axis of the bypass line crosses the laser light, and a particle converging member formed by a circular disk-like member and formed with a through hole facing the focal point FP. A gap is defined between the bypass line and an outer periphery of the particle converging member.
REFERENCES:
patent: 5271264 (1993-12-01), Chanayem
patent: 5534706 (1996-07-01), Borden et al.
patent: 5837094 (1998-11-01), Tsukazaki et al.
patent: 6947134 (2005-09-01), Chang et al.
patent: 2005/0145333 (2005-07-01), Kannan et al.
patent: 2008/0240905 (2008-10-01), Sugawara et al.
patent: 2008/0264338 (2008-10-01), Otsuki et al.
patent: 9-203704 (1997-08-01), None
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
Pham Hoa Q
Tokyo Electron Limited
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