Particle monitor system and substrate processing apparatus

Details Particle monitor system and substrate processing apparatus Particle monitor system and substrate processing apparatus

2011-06-28

2011-06-28

Lauchman, L. G (Department: 2877)

Optics: measuring and testing

By particle light scattering

With photocell detection

C356S335000

Reexamination Certificate

active

07969572

ABSTRACT:
A particle monitor system that can detect fine particles in a substrate processing apparatus. The substrate processing apparatus has a chamber in which a substrate is housed and subjected to processing, a dry pump that exhausts gas out of the chamber, and a bypass line that communicates the chamber and the dry pump together. The particle monitor system has a laser light oscillator that irradiates laser light toward a space in which the particles may be present, and a laser power measurement device that is disposed on an optical path of the laser light having passed through the space and measures the energy of the laser light.

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