Optics: measuring and testing – By particle light scattering – With photocell detection
Reexamination Certificate
2007-12-27
2010-02-23
Chowdhury, Tarifur (Department: 2886)
Optics: measuring and testing
By particle light scattering
With photocell detection
C356S339000
Reexamination Certificate
active
07667840
ABSTRACT:
The present invention provides a particle measuring system which is provided in a processing system that generates an atmosphere obtained by exhausting air or a gas in a processing chamber by a vacuum pump and applies a process concerning semiconductor manufacture to a wafer W in the atmosphere, attached to an exhaust pipe which connects an exhaust opening of the processing chamber with the vacuum pump, and measures the number of the particles in the exhaust gas, and a measuring method thereof, the system and method providing a processing system and a cleaning method which terminate etching process by determining an end point based on the number of the particles in the exhaust gas and perform cleaning of unnecessary films.
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Ikeda Kyoko
Matsuda Tsukasa
Otsuki Hayashi
Chowdhury Tarifur
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
Pajoohi Tara S
Tokyo Electron Limited
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